Berlin: de Gruyter, 2021. — 116 p.
This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.
Foreword
Saturation
Ligands
Precursors
Thermolysis
Nucleation
ALD processes
MLD processes
ALE processes