Springer, 2022. — xvi, 511 p. — (Lecture Notes in Electrical Engineering, 781).— ISBN 978-981-16-3766-7, 978-981-16-3767-4.
The book presents select proceedings of the International Conference on Micro and Nanoelectronics Devices, Circuits and Systems (MNDCS-2021). The volume includes cutting-edge research papers in the emerging fields of micro and nanoelectronics devices, circuits, and systems from experts working in these fields over the last decade. The book is a unique collection of chapters from different areas with a common theme and will be immensely useful to academic researchers and practitioners in the industry who work in this field.
Very large-scale integration (Vlsi) is a level of integration wherein millions of transistors and discrete components with their interconnections are integrated into a semiconductor substrate. Since the invention of the integrated circuit in 1959, its manufacturing process evolved several stages from small-scale integration (Ssi) to medium-scale integration (Msi), and finally came up with Vlsi in the late 1980s.
Advancement in the Vlsi technology has led to the development of high-speed complex electronic circuits in the deep submicron and nanoscale regime. Nanotechnology or nanoscience cannot be viewed as a discipline similar to electronics, semiconductor technology, chemical technology, biotechnology, etc., which represent convergence of disciplines in some sense. It implies that the readers of this area should be in a position to pass over the boundaries of all disciplines and come up with a new area of emerging electronics.
Over the past decades, due to shrinking feature size and increasing clock frequency, the interconnections in the Vlsi chip have primarily played an important role in determining the overall performance. In the recent research scenario, the interconnect delay dominates over the gate delay. With ever-increasing lengths inside a chip, global interconnects are prone to large interconnect delays, signal integrity
issues, and higher current densities. Therefore, most of the conventional materials (such as Al or Cu) are susceptible to electromigration due to high current density that substantially affects the reliability of high-speed Vlsi circuits. To avoid such problems, several nonsilicon or emerging devices are currently advocated as prospective material solutions in current and future nanotechnologies. Therefore, this book
presents state-of-the art technology solutions for current-edge Vlsi and nanoscale technology. In this book, a complete demonstration of electronics designing has been presented starting with the early-stage semiconductor devices and applications, and then moving on to the problem of scaling and Vlsi fabrication, Mosfet modelling aspects, analog and digital Vlsi designing, Fpga implementation using Verilog, Vlsi testing and reliability, recent on-chip interconnect problems, emerging technologies, and nonsilicon (nanoscale) transistors, etc.