Herman M.A., Richter W., Sitter H. Epitaxy: Physical Principles and Technical Implementation

Springer, 2004. — 529 p. — (Springer Series in Materials Science). — ISBN: 978-3-662-07064-2.Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy’s coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization.
It is intended for undergraduate students, PhD students, research scientists, lecturers and practicing engineers interested in materials science, solid state electronics and crystal growth.Homo- and Heteroepitaxial Crystallization Phenomena
Application Areas of Epitaxially Grown Layer Structures
Solid Phase Epitaxy
Liquid Phase Epitaxy
Vapor Phase Epitaxy
Molecular Beam Epitaxy
Metal Organic Vapor Phase Epitaxy
In-situ Analysis of Species and Transport
In-situ Surface Analysis
Thermodynamic Aspects
Atomistic Aspects
Quantum Mechanical Aspects
Heteroepitaxy; Growth Phenomena
Material-Related Problems of Heteroepitaxy.