Reinhardt K.A., Reidy R.F. (Eds.) Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications

Scrivener Publishing / Wiley, 2011. — 606 p. — ISBN: 978-0-470-62595-8.This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing.
This volume should become an essential part of a thorough training regimen on cleaning and surface preparation. It is a useful reference work for people active in the field and an absolute must for young engineers and researchers entering the dynamic and exciting discipline of cleaning and surface preparation. This handbook will help the industry avoid the unproductive and feared scenario of "reinventions" and provide a solid platform to build the new science and technology of cleaning and surface preparation for future applications far beyond the current
scope of cleaning science.