John Wiley & Sons, Inc., 2009. – 512 p. – ISBN: 0470406658
Solution Processing of Inorganic Materials covers everything from the more traditional fields of sol–gel processing and chemical bath deposition to the cutting–edge use of nanomaterials in thin–film deposition. In particular, the book focuses on materials and techniques that are compatible with high–throughput, low–cost, and low–temperature deposition processes such as spin coating, dip coating, printing, and stamping.
Introduction to Solution-Deposited Inorganic Electronics
Chemical Solution Deposition—Basic Principles
Solution Processing of Chalcogenide Semiconductors via Dimensional Reduction
Oxide Dielectric Films for Active Electronics
Liquid Silicon Materials
Spray CVD of Single-Source Precursors for Chalcopyrite I–III–VI 2 Thin-Film Materials
Chemical Bath Deposition, Electrodeposition, and Electroless Deposition of Semiconductors, Superconductors, and Oxide Materials
Successive Ionic Layer Adsorption and Reaction (SILAR) and Related Sequential Solution-Phase Deposition Techniques
Evaporation-Induced Self-Assembly for the Preparation of Porous Metal Oxide Films
Engineered Nanomaterials as Soluble Precursors for Inorganic Films
Functional Structures Assembled from Nanoscale Building Blocks
Patterning Techniques for Solution Deposition
Transfer Printing Techniques and Inorganic Single-Crystalline Materials for Flexible and Stretchable Electronics
Future Directions for Solution-Based Processing of Inorganic Materials