Wong A.K.-K. Optical Imaging in Projection Microlithography

The Society of Photo-Optical Instrumentation Engineers, Washington, USA, 2005. – 242 p. – ISBN: 047103570XHere for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing.Basic Electromagnetism
Elements of Geometrical Optics
Elements of Diffraction Theory
Imaging of Extended Objects with Finite Sources
Resolution and Image Enhancement
Oblique Rays
Aberrations
Numerical Computation
Variabilities
Appendices
Birefringence
Stationarity and Ergodicity
Some Zernike Polynomials
Simulator Accuracy Tests
Select Refractive Indexes
Assorted Theorems and Identities